200 mm Wafer-Scale Monolithic 3D Integration of ALD Oxide Semiconductors 200 mm晶圆级ALD氧化物半导体单片3D集成
arXiv:2608.09508 · 2026-08-10
The team fabricated more than 100,000 ALD InOx devices across three monolithically integrated tiers on 200 mm silicon, including ferroelectric and enhancement- and depletion-mode FETs. Threshold-voltage variation reaches 0.04 V standard deviation, electron mobility reaches 91.6 cm²/V·s, and cross-tier circuits operate; a modeled four-tier CIM accelerator delivers 1.4×–2.9× speedup over 2D baselines. The wafer-scale device data are the key result, while the accelerator comparison remains design-level evidence and the preprint does not yet establish production yield or long-term reliability. 研究团队在200 mm硅片上单片集成三层、超过100,000个ALD InOx器件,包括铁电FET以及增强型和耗尽型FET。器件阈值电压标准差低至0.04 V,电子迁移率最高91.6 cm²/V·s,跨层电路可以工作;基于该工艺设计的四层CIM加速器相对2D基线获得1.4×–2.9×加速。晶圆级器件数据是核心成果,但加速器比较仍属于设计层证据,预印本也尚未证明量产良率和长期可靠性。