L. Trupină, Ș. Neațu, L. Pintilie, et al.
Advanced Electronic Materials · 2026-06-18
Measurements on W/Hf0.5Zr0.5O2/p-Ge capacitors spanning 10 µm to 0.1 µm show that switched charge stays nearly constant as sweep rate changes, while the smallest 0.01 µm² devices fall below the current-detection floor because of parasitic capacitance. Submicron capacitors show an apparent rise in remanent polarization as perimeter-to-area ratio increases, pointing to edge-dominated switching. The result matters because geometry and measurement parasitics can masquerade as intrinsic ferroelectric improvement during scaling.
对尺寸从10 µm缩小到0.1 µm的W/Hf0.5Zr0.5O2/p-Ge电容器测量表明,扫描速率变化时翻转电荷基本不变,而最小的0.01 µm²器件因寄生电容影响,其翻转电流低于检测下限。亚微米电容器随着周长面积比提高,呈现出剩余极化增强的表观现象,说明边缘主导的翻转作用正在增大。该结果的重要性在于,缩放过程中几何效应和测量寄生项可能被误判为材料本征铁电性能提升。
Xiao Luo, Haoyu Zhang, Haoyun Liu, et al.
ACS Nano · 2026-06-17
The work monolithically integrates carbon-nanotube complementary FETs in a true vertically stacked CFET layout with 3D-stacked photodiodes, and demonstrates logic gates, a 4-transistor SRAM cell, and a five-stage ring oscillator. Its inverters reach a peak gain of 147 at 1 V and retain a gain of 9.7 with 3.3 pW static power at 0.2 V. This is a measured route toward unified sensing and computing, although the research-scale stack still needs evidence on array yield and process uniformity.
该工作将真正垂直堆叠结构的碳纳米管互补FET与3D堆叠光电二极管进行单片集成,并演示了逻辑门、4晶体管SRAM单元和五级环形振荡器。其反相器在1 V下峰值增益达到147,在0.2 V下以3.3 pW静态功耗仍保持9.7的增益。它为感知与计算一体化提供了实测路径,但研究级堆叠仍需补充阵列良率与工艺均匀性证据。
Nuertai Jiazila, Jiequn Sun, Yunhao Wang, et al.
2D Materials · 2026-06-15
Ultraviolet-ozone conversion of HfS2 produces a van der Waals-integrable HfOx dielectric with an approximately 8.9 MV/cm breakdown field, dielectric constant near 9.6, and leakage around 10^-5 A/cm². MoS2 transistors using the dielectric show an on/off ratio near 10^9, mobility of about 35.3 cm²/V·s, and an 80.2 mV/dec subthreshold swing; floating-gate devices reach a 14 V memory window. The device data are promising for cleaner 2D interfaces, but endurance, wafer-scale uniformity, and integration yield remain open.
通过紫外臭氧将HfS2转化为可进行范德华集成的HfOx介质,其击穿场约为8.9 MV/cm、介电常数约9.6、漏电流约10^-5 A/cm²。采用该介质的MoS2晶体管开关比接近10^9、迁移率约35.3 cm²/V·s、亚阈值摆幅为80.2 mV/dec;浮栅器件的存储窗口达到14 V。这些器件数据有利于构建更洁净的二维材料界面,但耐久性、晶圆级均匀性和集成良率仍待验证。